Lithography Stepper
Noel’s broad Lithography capabilities include 4 Steppers & 2 Contact Aligners to accommodate many applications from manufacturing multiple chip on a wafer to single wafer devices.
Lithography Service I Line 365nm Stepper
Noel’s broad Lithography capabilities include 4 Steppers & 2 Contact Aligners to accommodate many applications from manufacturing multiple chip on a wafer to single wafer devices.
Noel provides CAD & Layout services using customer supplied data files.
Noel offers a wide range of Photo Resist options. See Photo Resist Blanket Coatings.
Stepper Lithography
Stepper Lithography
XLS UltraTech Steppers XLS200, XLS100
200mm Semi Std Notch 725um +/-25um Silicon or Glass Substrates
Minimum Resolution =500nm (1um Photo Resist)
Wide Range of Photo Resist 1um to 10um 2X1 Aspect Ratio
Filed Size= Size 20mm X 20mm
GCA Stepper
200mm, 150mm, 100mm, Square Substrates
Minimum Resolution =1um
Wide Range of Photo Resist 1um to 10um
Field Size =15mm X 15mm
Contact Print Lithography
1X
100mm, 150mm, 200mm & 300mm Silicon, Glass or other materials
Soda Lime or Quartz Masks Available
Minimum Feature:
100mm, 150mm & 200mm >2um
300mm >5um
Wide Range of Photo Resist 1um to 50um
Filed Size=Up to the entire wafer
Cross Section SEM Profiles available upon request.