PHOTORESIST SPIN COATINGS FOR LITHOGRAPHY & BLANKET COATINGS
Noel’s broad range of blanket coatings & Lithography resist options are available for specific application requirements:
- Semiconductor
- Bio-Medical & Life Sciences
- MEMS
All of these applications have various feature sizes, resolution requirements that drive the type of resist, thickness of the resist, any etch requirements, lift-off of non-etch-able metals. Many variables that Noel has qualified and can run a project to meet a specific application requirement.
1um I Line for small features 500nm
10um I Line for larger features, deep etches
Lift-Off Resist
BiLayer Lift-Off Resist
3um Plating Resist that can define 1um features, plate 3-5um high features
20um Plating Resist that can define >10um features, plate 15um-20um high features
50um SU-8 for mold applications
| RESIST | NOMINAL THICKNESS RANGE | WAVELENGTH | TYPE | STANDARD EBR |
|---|---|---|---|---|
| AR 3GSF-600 | 600A to 800A | 248nm DUV | Anti-Reflective Coat | 1mm |
| AZ 125nXT-10A | 35um t-60um | 365nm I Line | Negative tone, Plating Resist | 1mm |
| AZ 125nXT-7A | 5um-20um | 365nm I Line | Negative tone, Plating Resist | 1mm |
| AZ 12XT-20PL-05 | 5um-10um | 365nm I Line | Positive Tone | 1mm |
| AZ nLoF 2020 | 2.5um | 365nm I Line | Negative Tone, Lift-Off | 1mm |
| AZ nLoF 2035 | 5um | 365nm I Line | Negative Tone, Lift-Off | 1mm |
| HD 4002 | 2um | 365nm I Line | Negative Tone, Photo-Definable | 1mm |
| LOR 20A | 2um | 365nm I Line | Bi-Layer | 1mm |
| SPR 220-3.0 | 3.5um to 5um | 365nm I Line | Positive Tone | 1mm |
| SPR 220-7.0 | 5um to 10um | 365nm I Line | Positive Tone | 1mm |
| SPR 3012 | 2.5um to 3.8um | 365nm I Line | Positive Tone | Stepper, Contact Print |
| SPR 955CM-0.7 | 1um | 365nm I Line | Positive Tone | Stepper, Contact Print |
| SU-8 2002 | 1um to 2.5um | 365nm I Line | Negative Tone | Stepper, Contact Print |
| SU-8 2005 | 2um to 5um | 365nm I Line | Negative Tone | Stepper, Contact Print |
| SU-8 2010 | 5um to 10um | 365nm I Line | Negative Tone | Stepper, Contact Print |
| SU-8 2015 | 10um to 25um | 365nm I Line | Negative Tone | Stepper, Contact Print |
| SU-8 2025 | 25um to 50um | 365nm I Line | Negative Tone | Stepper, Contact Print |
| SU-8 3035 | 50um to 75um | 365nm I Line | Negative Tone | Stepper, Contact Print |
| TARF-P6111 | 1500A to 2000A | 193nm | Blanket Coat Only | |
| TARF-P7052 | 7000A | 193nm | Blanket Coat Only | |
| TARF-Pi6-144 | 800A | 193nm | Blanket Coat Only | |
| UV 210GS-0.6 | 2um | 248nm DUV | Positive Tone | Stepper |
| UV 6-0.8 | 7000A | 248nm DUV | Positive Tone | Stepper |
| Notes: | ||||
| 1. Contact Noel for specific thickness requirements, bake conditions, EBR. | ||||
| 2. Noel validates the resist thickness via optical metrology to confirm the mean thickness range on silicon substrates on resist thickness <10um. On resist that is >10um a step height measurement is taken on silicon substrates. | ||||
| 3. For Lithography applications contact Noel for specific bake requirements, any subsequent etch requirements. | ||||