NoelTech

RCA Clean / LPC Single Wafer Clean

RCA Clean (SC1-SC2)

Process Steps Process Flow Process Details
1
RCA Clean
SC1 + SC2 @ 50C for 20' (each bath)
2
Rinse/SRD
DI H2O for 20'; Standard SRD
3
Visual Inspection
100% Visual

RCA

SC1 chemical Ratio:  40:1:1

DI Water (40 Parts), Hydrogen Peroxide (1 Part), Ammonia Hydroxide (1 Part)

SC2 Chemical Ratio:  160:4:1

DI Water (160 Parts), Hydrogen Peroxide (4 Parts), Hydrochloric (1 Part)

LPC Single Wafer Clean

Process Steps Process Flow Process Details
Single Wafer
LPC Clean
80:2:1 DI Water 80 Parts
1
Hydrogen Peroxide 2 Parts
2
Spin dry
Ammonia Hydroxide 1 Part
Inspect Wafer

Note

Above process for Non-Patterned Wafers.

Patterned wafers require a technical review of the feature size, films prior to accepting material.

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