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Facilities
Process development and fabrication up to 300mm
Noel Technologies facilities include:
Class 100 clean rooms
Wet labs & laboratories
Metrology
We are equipped for process development and fabrication with substrates sizes of 300mm (12 inch) to as small as 2-inch substrates. Noel Technologies also has capability to handle:
Square substrates
Quartz
Borofloat
Non-silicon substrates
Coupons & Chiplets
Process tools available:
Lithography Tools:
Contact Printers 1 X
Stepper 4X & 5X <0.5um
Thermal Oxide Furnaces
LPCVD Deposition Systems: Nitride
PECVD Deposition Systems
PVD Thin Film Metals
Plasma Etch Tools
Extensive WET Etch Capability
P-15 Profiler
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