Lithography Services
Noel’s broad Lithography capabilities accommodate many applications from manufacturing multiple chip on a wafer to single wafer devices.
Lithography Service I LINE 365nm Stepper
- Noel Tech’s Broad Lithography capabilities include 4 Steppers & 2 Contact Aligners to accommodate many applications from manufacturing multiple chip on a wafer to single wafer devices.
- Noel provides CAD & Layout services using customer supplied data files.
- Noel offers a wide range of Photo Resist options. See Photo Resist Blanket Coatings.
Lithography Service I LINE 365nm Stepper
XLS UltraTech Steppers XLS200, XLS100
- 200mm Semi Std Notch 725um +/-25um Silicon or Glass Substrates
- Minimum Resolution =500nm (1um Photo Resist)
- Wide Range of Photo Resist 1um to 10um 2X1 Aspect Ratio
- Field Size= Size 20mm X 20mm
GCA Stepper
- 200mm, 150mm, 100mm, Square Substrates
- Minimum Resolution =1um
- Wide Range of Photo Resist 1um to 10um
- Field Size =15mm X 15mm
Stepper Lithography
XLS UltraTech Steppers XLS200, XLS100
- 200mm Semi Std Notch 725um +/-25um Silicon or Glass Substrates
- Minimum Resolution =500nm (1um Photo Resist)
- Wide Range of Photo Resist 1um to 10um 2X1 Aspect Ratio
- Field Size= Size 20mm X 20mm
GCA Stepper
- 200mm, 150mm, 100mm, Square Substrates
- Minimum Resolution =1um
- Wide Range of Photo Resist 1um to 10um
- Field Size =15mm X 15mm
Contact Print Lithography 1X
- 100mm, 150mm, 200mm & 300mm Silicon, Glass or other materials
- Soda Lime or Quartz Masks Available
- Minimum Feature:
- 100mm, 150mm & 200mm >2um
- 300mm >5um
- Wide Range of Photo Resist 1um to 50um
- Filed Size=Up to the entire wafer
- Cross Section SEM Profiles available upon request.
Outsource your ASML “Zero” layer to Noel Technologies
- Start material with patterned and etched “zero” layers
- Etch depth SPC controlled to 1200A ±200A
- Pre-alignment & fine alignment characterization of all wafers, with batch statistics, available
Use Noel Technologies as your lithography cell backup and short term capacity add partner
- Lithography cell qualified to customer specifications
- Matched to customer WIP
- Regular lithography cell monitoring provides risk free switching
Calibrated wafer grid definition and target placement optimization
- Patterned, etched, alignment targets (for any system) placement to an accuracy of <15nm
- Alignment targets (for any system) on both sides of the wafer, with an overlay accuracy of <300nm (front to back)
Lens distortion and Focal Plane metrology
- Characterize and monitor your lens X,Y distortion
- Characterize and monitor your lens Focal Plane
Noel provides Pilot production runs: Lab to Fab
- Build your product using a foundry lithography system, it’s scalable, ready for production
- Outsource your critical layers to reduce your costs
Research and Development
- Explore your next technology node using Noel’s lithography cell
- Develop your first prototype devices
*Cross Section SEM Profiles available uponrequest
For more details: