Photo Resist for Lithography and Blanket Coatings
Photo Resist
Noel’s broad range of blanket coatings & Lithography resist options are available for specific application requirements:
- Semiconductor
- Bio-Medical & Life Sciences
- MEMS
All of these applications have various feature sizes and resolution requirements that determine the type of resist, thickness of the resist, any etch requirements, and lift-off of non-etch-able metals.
- 1um I Line for small features 500nm
- 10um I Line for larger features, deep etches
- Lift-Off Resist
- BiLayer Lift-Off Resist
- 3um Plating Resist that can define 1um features, plate 3-5um high features
- 20um Plating Resist that can define >10um features, plate 15um-20um high features
- 50um SU-8 for mold applications
| Resist | Nominal Thickness Range | Wavelength | Type | Standard EBR |
|---|---|---|---|---|
|
TARF-P6111 |
1500A to 2000A |
193nm |
|
Blanket Coat Only |
|
TARF-P7052 |
7000A |
193nm |
|
Blanket Coat Only |
|
TARF-Pi6-144 |
800A |
193nm |
|
Blanket Coat Only |
|
AR 3GSF-600 |
600A to 800A |
248nm DUV |
Anti-Reflective Coat |
Blanket Coating Only |
|
UV 210GS-0.6 |
2um |
248nm DUV |
Positive Tone |
Blanket Coating Only |
|
UV 6-0.8 |
7000A |
248nm DUV |
Positive Tone |
Blanket Coating Only |
|
|
|
|
|
|
|
AZ 125nXT-10A |
35um t-60um |
365nm I Line |
Negative tone, Plating Resist |
Lithography & Blanket Coating |
|
AZ 125nXT-7A |
5um-20um |
365nm I Line |
Negative tone, Plating Resist |
Lithography & Blanket Coating |
|
AZ 12XT-20PL-05 |
5um to 10um |
365nm I Line |
Positive Tone |
Lithography & Blanket Coating |
|
AZ nLoF 2020 |
2.5um |
365nm I Line |
Negative Tone, Lift-Off |
Lithography & Blanket Coating |
|
AZ nLoF 2035 |
5um |
365nm I Line |
Negative Tone, Lift-Off |
Lithography & Blanket Coating |
|
HD 4002 |
2um |
365nm I Line |
Negative Tone, Photo-Definable |
Lithography & Blanket Coating |
|
LOR 20A |
2um |
365nm I Line |
Bi-Layer |
Lithography & Blanket Coating |
|
SPR 220-3.0 |
3.5um to 5um |
365nm I Line |
Positive Tone |
Lithography & Blanket Coating |
|
SPR 220-7.0
|
5um to 10um |
365nm I Line |
Positive Tone |
Lithography & Blanket Coating |
|
SPR 3012 |
2.5um to 3.8um |
365nm I Line |
Positive Tone |
Lithography & Blanket Coating |
|
SPR 955CM-0.7 |
1um |
365nm I Line |
Positive Tone |
Lithography & Blanket Coating |
|
SU-8 2002 |
1um to 2.5um |
365nm I Line |
Negative Tone |
Lithography & Blanket Coating |
|
SU-8 2005 |
2um to 5um |
365nm I Line |
Negative Tone |
Lithography & Blanket Coating |
|
SU-8 2010 |
5um to 10um |
365nm I Line |
Negative Tone |
Lithography & Blanket Coating |
|
SU-8 2015 |
10um to 25um |
365nm I Line |
Negative Tone |
Lithography & Blanket Coating |
|
SU-8 2025 |
25um to 50um |
365nm I Line |
Negative Tone |
Lithography & Blanket Coating |
|
SU-8 3035 |
50um to 75um |
365nm I Line |
Negative Tone
|
Lithography & Blanket Coating |
Notes:
- Contact Noel for specific thickness requirements, bake conditions, EBR.
- Noel validates the resist thickness via optical metrology to confirm the mean thickness range on silicon substrates on resist thickness <10um. On resist that is >10um a step height measurement is taken on silicon substrates.
- For Lithography applications contact Noel for specific bake requirements, any subsequent etch requirements.